ИСТИНА

• Охват: Международная
• Даты проведения: 29 ноября - 2 декабря 2014
• Место проведения: Гонконгский университет науки и технологии, Hong Kong
• Организатор:
  Гонконгский университет науки и технологии
• Число участников: 100
• Число участников из МГУ: 1
• Число докладчиков: 50
• Веб-сайт: http://phosm2014.ust.hk/
• Описание конференции:

  This conference series focuses on photosensitive polymers (amorphous, liquid-crystalline, uncross-linked and cross-linked) and molecular glasses, as well as derived composite materials. In addition to fundamental science, an important topic is the diverse technical applications of the photosensitive materials. The conference aims to bring together leading theoreticians and experimentalists to discuss in a congenial atmosphere a controversial and unsolved issue of photopatterning in azo-containing materials. The conference concentrates on the following subjects: · Cis-trans photo-isomerization · Photocrosslinking · Photodegradation · Orientational diffusion · Photoalignment and photodeformation · Photosoftening and photofluidity · Photopatterning · Computer modelling of photoinduced effects · Theoretical approaches to photopatterning · Synthesis of photosensitive polymers · Chemical structure and properties of photoaligning materials · Technical applications of photoalignment and photopatterning in liquid crystal elements for displays and photonics, light emitted diodes (OLED), solar cells, optical data storage and holographic memory devices.

• Добавил в систему: Богданов Алексей Владимирович

Доклады:

• 2014 The Role of Domain Structure Rearrangement in Photo-Orientation of Liquid-Crystalline Azobenzene Materials (Устный)
• Авторы: Bogdanov A.V., Vorobiev A.Kh, Bobrovsky A.Yu