ИСТИНА

• Член программного комитета: Рахимова Т.В.
• Охват: Международная
• Даты проведения: 20-21 мая 2019
• Место проведения: Гренобль, France
• Число участников: 80
• Число иностранных участников: 75
• Число участников из МГУ: 1
• Веб-сайт: http://pesm2019.insight-outside.fr/
• Описание конференции:

  This workshop is the 11th in a series devoted to plasma etch and strip processes for micro, nano and bio- technologies. This year’s workshop also addresses new and challenging topics in the field of emerging nanoscale devices such as MEMS/NEMS, optronics devices and 3D Integration. The workshop will also be open to new topics like plasma for biotechnology. The objective of the workshop is to provide a forum for open discussions between science and industrial application. It is dedicated to scientists, process engineers and Ph-D students. Topics include both fundamental and applied research, as well as issues related to introduction into manufacturing, with the progressive downscaling of device dimensions and the simultaneous demand for more functionality. Invited talks will be given by scientific and technical leaders in each of the key areas to present the current state-of-the-art and to stimulate technical discussions.

• Добавил в систему: Воронина Екатерина Николаевна

Доклады:

• 2019 Dry Cleaning of Transition-Metal Dichalcogenides Using Reducing Downstream Plasma (Устный)
• Авторы: Marinov D., de Marneffe J.F., Voronina E.N., Mankelevich Yu A., Rakhimova T.V.

• 2019 Pore sealing in low-k dielectrics by low-energy ions (Устный)
• Авторы: Voronina E.N., Lopaev D.V., Sycheva A.A., Rakhimova T.V., Mankelevich Yu A.

• 2019 Understanding the interaction mechanisms between amorphous carbon sacrificial patterning material and H2 plasma to enable area-selective ALD processes (Устный)
• Авторы: Zyulkov I., Voronina E.N., Chan BT, Armini S., Rakhimova T.V., De Gendt S., Mankelevich Yu A.