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The 19th International Vacuum Congress (IVC-19) was held on 9-13 September 2013 at the "Palais des congrès" in Paris (France) jointly with the 2013 International Conference on Nanoscience and Technology (ICN+T 2013), the 15th International Conference on Solid Surfaces (ICSS-15), the 2013 conference on Innovations in Thin Film Processing and Characterisation (ITFPC 2013), the 2013 European conference on Magnetron, Ion Processing & Arc Technologies (MIATEC 2013), the 19th International Colloquium on Plasma Processes (CIP 2013) and the 2013 conference on Reactive Sputter Deposition (RSD 2013). This was the premier global forum in 2013 for researchers active in the science and engineering of materials, surfaces, thin films and coatings for diverse applications and environments at scales from the nano to the macro. A large exhibition was running alongside the conference during the heart of the meeting, from 10 to 12 September 2013. The congress is organized on behalf of the International Union for Vacuum Science, Technique and Applications (IUVSTA) by a consortium of European Vacuum Societies (Belgian Vacuum Society, British Vacuum Council, Croatian Vacuum Society, Czech Vacuum Society, French Vacuum Society, Hungarian Vacuum Society, Portuguese Vacuum Society, Slovak Vacuum Society, Slovenian Vacuum Society) willing to work together in close interaction to increase scientific and technical links and collaboration within Europe.