ИСТИНА

• Охват: Международная
• Даты проведения: 2013
• Место проведения: La Quinta, California, USA
• Описание конференции:

  The 2013 Workshop is the 22nd in a series of meetings that span 32 years promoting the continuing evolution of lithography. The speakers at the Workshop are selected by invitation and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements.

• Добавил в систему: Кобельков Сергей Георгиевич

Доклады:

• 2013 Use of Pixel-based Mask Optimization for Local Printability Enhancement (Пленарный)
• Авторы: Alexander Tritchkov, Родин Сергей, Kyohei Sakajiri, Кобельков Сергей