ИСТИНА

• Член программного комитета: Рахимова Т.В.
• Охват: Международная
• Даты проведения: 18-20 октября 2017
• Место проведения: Лёвен, Belgium
• Организатор:
  IMEC
• Число участников: 60
• Число участников из МГУ: 1
• Веб-сайт: http://www.pesm-conference.org/
• Описание конференции:

  This workshop is the 10th in a series devoted to plasma etch and strip processes for micro- and nano-technologies. PESM is an annual event co-organized by imec v.z.w. (Belgium), the LTM-CNRS (France) and the Leti-CEA (France). The objective of the workshop is to provide a forum for open discussions across fundamental and applied sciences and industrial applications. It is dedicated to plasma and materials scientists, process engineers, post-doc and PhD students. The 2017 edition will address challenging topics in the field of new patterning approaches for logic devices (FEOL), emerging patterning technologies and materials, patterning for BEOL and 3D packaging, patterning for memory application and non-volatile materials, plasma modeling and process diagnostics

• Добавил в систему: Рахимова Татьяна Викторовна

Доклады:

• 2017 DFT simulations of fluorine and chlorine atoms and molecules interactions with MoS2 monolayer (Устный)
• Авторы: Mankelevich Yu A., Rakhimova T.V., de Marneffe J.F., Heyne M., Marinov D., Voronina E.N.