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ИСТИНА ЦЭМИ РАН |
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The chemical vapor deposition (CVD) setup combining reactor and scanning probe microscope (SPM) was developed using principles described earlier. Exceptional feature of the created setup is its ability to provide in-situ measurements during deposition process.
№ | Имя | Описание | Имя файла | Размер | Добавлен |
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1. | Краткий текст | Abstract | NPO2018_Loginov_Abstract_3.docx | 1,0 МБ | 17 августа 2018 [Artem_Loginov] |