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Most of the known methods for the production of VO2-based films require precise control of the partial pressure of oxygen, since vanadium is capable of exhibiting various degrees of oxidation. We proposed a method for the production of VO2 films based on the reaction of vanadyl volatile complexes with water vapor. Earlier, we showed that the precursor VO(hfa)2 made it possible to obtain films with an acute DM transition, however when switching to larger samples, it was found that such films were highly inhomogeneous. Therefore, other compounds of vanadyl - VO(acac)2 and VO(thd)2 have been tested. It was demonstrated a decrease in the concentration of grain boundaries after recrystallization annealing at 600°C led to an increase in the amplitude of the DM transition. In the course of the work, uniform single-phase films of vanadium dioxide were obtained on single-crystal R-Al2O3 substrates with a diameter of 3 inches.