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ИСТИНА ЦЭМИ РАН |
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This work is devoted to the growth of nanostructured films consisting of carbon nanowalls (CNWs) in plasma of DC glow discharge. We obtained films of several different morphologies and proposed phenomenological models for different mechanisms of secondary nucleation responsible for their formation. These results allowed us to realize multi-step growth in a single continuous process. It is a simple and effective way to modulate film morphology thus modifying total surface area and pore size distribution, parameters which are important for applications in electrochemical power engineering (e.g. supercapacitors).