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We present results of optical emission spectroscopy study of a plasma-enhanced chemical vapor deposition of carbon films. The materials produced in this study were the diamond films, containing unique pyramidal diamond crystal lites [1], and the films, consisting of vertically oriented carbon nanowalls [2]. These carbon films were deposited from a hydrogen and methane gas mixture activated by a direct current discharge (typical parameters: methane flow rate 10 sccm, hydrogen flow rate 130 sccm, total pressure 10 kPa, voltage 700 V, current 6 A, Si substrate’s temperature at anode 950 °C). The optical emission spectra were recorded at different scanning points of the plasma discharge to provide a spatial mapping of the electron and gas temperatures, as well as any emission line from the available spectrome ter range. Slightly resolved ro-vibrational optical emission spectrum of the C2 Swan band system was used for gas temperature measurements. Gas temperature was estimated by comparison method: the calculated spectrum was compared with the experimental one until the best match. In order to increase comparison procedure speed and to reduce it’s subjectivity, comparison work was delegated to the machine learning algorithms. This, in turn, allowed to create temperature distribution maps in a reasonable time [3]. The obtained results might be used for optimization of the deposition process and for revealing new mechanisms explaining formation of the carbon materials with different properties. The work was supported by RSF #19-79-00203 and by RFBR #18-29-19071 (CVD, Optical parts and Si purchase) References: 1. Malykhin S., Mindarava Y., Ismagilov R., Orekhov A., Jelezko F., Obraztsov A. (2019). Physica Status Solidi (b), 256(9), 180072 2. Kleshch V. I., Bandurin D. A., Serbun P., Ismagilov R. R., Lützenkirchen‐Hecht D., Müller G., Obraztsov A. N. (2018), Physica Status Solidi (b), 255(1), 1700270 3. Ismagilov R. R., Kudarenko I. P., Malykhin S. A., Babin S. D., Loginov A. B., Kleshch V. I., Obraztsov A. N. (2020), arXiv:2011.12647.