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Thin commercially available films of such material as polyethylene terephthalate are characterized by high values of mechanical strength, high chemical and thermal and radiation resistance, has high transparency in the visible and near-infrared range of the spectrum. Such films are promising for recording by microlithography methods with high density of information and its long-term storage. Recording of information can be carried out by deep X-ray lithography. For this purpose, the sensitivity of the material with respect to the dose of absorbed radiation and the rate of removal of the irradiated material from the surface of the original film was studied in this work, resulting in a complex dependence of the removal selectivity on the concentration of alkali as a reagent. The resulting relief has the character of a developed regular volumetric microstructure. Thus, regular polymer matrices with cone and cylindrical pore geometry were obtained. Metallic and dielectric cone microstructures were obtained using such matrices.