Nanometer Scale Lithography with Evaporated Polystyreneстатья
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Web of Science ,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 10 августа 2018 г.
Авторы:
Zharik G.A. ,
Dagesyan S.A. ,
Soldatov E.S. ,
Presnov D.E. ,
Krupenin V.A.
Журнал:
Moscow University Physics Bulletin
Том:
72
Номер:
6
Год издания:
2017
Издательство:
Allerton Press
Местоположение издательства:
New York, N.Y., United States
Первая страница:
627
Последняя страница:
632
DOI:
10.3103/s0027134917060224
Аннотация:
We report on a fabrication method of extremely small metallic nanostructures which uses commercially available polystyrene with low molecular weight as a negative resist for electron-beam lithography. The samples were covered with polystyrene by physical vapor deposition. The method allows to form structures with a high (5–10 nm) spatial resolution and a high yield on non-uniform arbitrary shaped surfaces. The technological processes for forming line or dot arrays, electrodes with nanogaps, and radially located electrodes were developed. The process parameters are presented in this work. The possibility of fabrication of nanostructures on a cantilever tip apex of the scanning probe microscope was also demonstrated.
Keywords: electron-beam lithography evaporated resist polystyrene nanostructures
Original Russian Text © G.A. Zharik, S.A. Dagesyan, E.S. Soldatov, D.E. Presnov, V.A. Krupenin, 2017, published in Vestnik Moskovskogo Universiteta, Seriya 3: Fizika, Astronomiya, 2017, No. 6, pp. 121–126. http://vmu.phys.msu.ru/abstract/2017/6/17-6-120/
Добавил в систему:
Преснов Денис Евгеньевич