Formation of carbonic and silicon dioxide structured films by decomposition of molecules on the surface of ionic crystals under the action of IR femtosecond laser radiationстатья
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Дата последнего поиска статьи во внешних источниках: 28 октября 2016 г.
Аннотация:This study relates to the formation of carbon and silicon dioxide films that occurs as a result of the decomposition of organic and silicon-containing molecules on the surface of ionic crystals under IR femtosecond laser radiation of moderate intensity (~1011 W cm−2) without molecular decomposition in the gas phase. We found that transparent graphite oxide films formed in the case of CO2 molecule decomposition.