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Reactive chemical vapor deposition method as new approach for obtaining electroluminescent thin film materialsстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 19 июля 2013 г.
- Авторы: Utochnikova Valentina V., Kotova Oxana V., Vaschenko Andrey A., Lepnev Leonid S., Kuzmina Natalia P.
- Журнал: Advances in Materials Science and Engineering
- Год издания: 2012
- Издательство: Hindawi Publishing Corporation
- Местоположение издательства: United States
- Первая страница: 809028
- DOI: 10.1155/2012/809028
- Аннотация: The new reactive chemical vapor deposition (RCVD) method has been proposed for thin film deposition of luminescent nonvolatile lanthanide aromatic carboxylates. This method is based on metathesis reaction between the vapors of volatile lanthanide dipivaloylmethanate (Ln(dpm)3) and carboxylic acid (HCarb orH2Carb′) and was successfully used in case of HCarb. Advantages of the method were demonstrated on example of terbium benzoate (Tb(bz)3) and o-phenoxybenzoate thin films, and Tb(bz)3 thin films were successfully examined in the OLED with the following structure glass/ITO/PEDOT:PSS/TPD/Tb(bz)3/Ca/Al. Electroluminescence spectra of Tb(bz)3 showed only typical luminescent bands, originated from transitions of the terbium ion. Method peculiarities for deposition of compounds of dibasic acids H2Carb′ are established on example of terbium and europium terephtalates and europium 2,6-naphtalenedicarboxylate.
- Добавил в систему: Уточникова Валентина Владимировна