Modeling of dielectric polarization during an electron beam exposureстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
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Авторы:
Borisov S.S.,
Grachev E.A.,
Zaitsev S.I.,
Negulyaev N.N.,
Cheremukhin E.A.
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Сборник:
Proceedings of SPIE - The International Society for Optical Engineering
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Год издания:
2004
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Первая страница:
186
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Последняя страница:
193
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DOI:
10.1117/12.552222
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Аннотация:
From Conference Volume 5398
Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics
Anatoly M. Filachev
March 01, 2004
Abstract
On the basis of Monte-Carlo method a new approach to modeling of an electron interaction with a substance is offered. Some phenomena concerned with spatial energy distribution and accumulation of a charge in an irradiated sample are considered. Calculations of distributions of electric potential and resists polarization induced by an injected charge are presented. It is shown that charging is still the essential circumstance, capable to cause significant loss of accuracy in electron-beam lithography.
© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Topics
Dielectric polarization ; Electron beams ; Electrons ; Lithography ; Modeling ; Polarization
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Добавил в систему:
Грачев Евгений Александрович