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High-Performance Atomistic Modeling of Evaporation of Thin Films Under Intense Laser Irradiationстатья
- Авторы: Grigoriev Fedor, Sulimov Vladimir, Tikhonravov Alexander
- Сборник: V. Voevodin and S. Sobolev (Eds.): RuSCDays 2021, CCIS 1510
- Год издания: 2021
- Издательство: Springer Nature
- Местоположение издательства: Switzerland
- Первая страница: 114
- Последняя страница: 124
- Аннотация: Abstract. This paper presents the results of high-performance atomistic modeling of heating and the initial stage of evaporation of thin silicon dioxide films under the action of high-power laser radiation. Both dense isotropic films obtained by normal deposition and highly porous anisotropic silicon dioxide films obtained by deposition at a large angle to the substrate are investigated. The dependence of the initial stage of film evaporation on its structural properties is analyzed.
- Добавил в систему: Григорьев Федор Васильевич