Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglowстатья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:Removal of amorphous carbon and tin films from a Mo:Si multilayer mirror surface in a hydrogen
plasma and its afterglow is investigated. In the afterglow, the mechanism of Sn and C films
removal is solely driven by hydrogen atoms (radicals). Probabilities of Sn and C atoms removal by
H atoms were measured. It was shown that the radical mechanism is also dominant for Sn atoms
removal in the hydrogen plasma because of the low ion energy and flux. Unlike for Sn, the removal
mechanism for C atoms in the plasma is ion-stimulated and provides a much higher removal rate.