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Wave field transformation at coherent imaging of a tilted reflection maskстатья
- Авторы: Artyukov Igor A., Popov Alexei V., Vinogradov Alexander V.
- Сборник: Soft X-Ray Lasers and Applications VIII
- Серия: PROCEEDINGS OF SPIE
- Том: 7451
- Год издания: 2009
- Место издания: SPIE
- Номер статьи: 74510I
- DOI: 10.1117/12.825929
- Аннотация: We describe recent advances in the demonstration of table-top full field microscopes that use soft x-ray lasers for illumination. We have achieved wavelength resolution and single shot exposure operation with a very compact 46.9 nm microscope based on a desk-top size capillary discharge laser. This λ=46.9 nm microscope has been used to captured full field images of a variety of nanostructure systems and surfaces. In a separate development we have demonstrated a zone plate microscope that uses λ=13.2 nm laser illumination to image absorption defects in a extreme ultraviolet lithography (EUVL) mask in the same geometry used in a 4x demagnification EUVL stepper. Characterization of the microscope's transfer function shows it can resolve 55 nm half period patterns. With these capabilities, the λ=13.2 nm microscope is well suited for evaluation of pattern and defect printability of EUVL masks for the 22 nm node.
- Добавил в систему: Артюков Игорь Анатольевич