Место издания:Московский государственный университет, НИИЯФ МГУ Москва, Россия
Первая страница:79
Последняя страница:83
Аннотация:Homoepitaxial ZnO films, doped by gallium, were deposited on monocrystal substrates of
silicon by a method pulse laser deposition. The metal films of contacts Al, Au, Cu, Ta, Ti were
deposited on substrates of silicon and ZnO films by the same method. By a method of measurement
U-I characteristics it is established, that contacts Ta/n-ZnO and Ti/n-ZnO and Au/p-Si are ohmic.
For contacts Al and Cu on silicon presence of Shottky barrier was observed.