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Статьи в журналах
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- 2016 Microwave Plasma-Activated Chemical Vapor Deposition ofNitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas
- Truscott Benjamin S., Kelly Mark W., Potter Katie J., and Michael N.R.Ashfold, Mankelevich Yuri A.
- в журнале The Journal of Physical Chemistry A: Molecules, Clusters, and Aerosols, издательство American Chemical Society (United States), том 120, с. 8537-8549 DOI