Proc. SPIE, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020сборник

Статьи, опубликованные в сборнике

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  • 2020 Experimental verification of sub-wavelength holographic lithigraphy (SWHL) concept
  • Borisov M., Chelubeev D., Chernik V., Merkushov L., Rakhovskiy V., Shamaev A.
  • в сборнике Proc. SPIE, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, издательство Society of Photo-Optical Instrumentation Engineers (United States), том 11324, с. 113241J-1-113241J-2 DOI
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  • 2020 Maskless holographic schemes based on phase micromirror SLMs
  • Borisov M., Chelubeev D., Chernik V., Merkushov L., Rakhovskiy V., Shamaev A.
  • в сборнике Proc. SPIE, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, издательство Society of Photo-Optical Instrumentation Engineers (United States), том 11324, с. 113241K-1-113241K-8 DOI
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  • 2020 Mathematical problems of holographic mask synthesis
  • Borisov M., Chelubeev D., Chernik V., Merkushov L., Rakhovskiy V., Shamaev A.
  • в сборнике Proc. SPIE, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, издательство Society of Photo-Optical Instrumentation Engineers (United States), том 11324, с. 113241I-1-113241I-9 DOI
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  • 2020 Sub-wavelength holographic lithography (SWHL)
  • Borisov M., Chelubeev D., Chernik V., Rakhovskiy V., Shamaev A.
  • в сборнике Proc. SPIE, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, издательство Society of Photo-Optical Instrumentation Engineers (United States), том 11324, с. 1132417-1-1132417-14 DOI